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Beilstein J. Nanotechnol. 2024, 15, 447–456, doi:10.3762/bjnano.15.40
Figure 1: SE image of a deposited FEBID carbon line, top view (a) and FIB cross section (b). The line was dep...
Figure 2: Simulated etching by FEBIE of a planar FEBID surface (a) and the evolution of the sloped sidewalls ...
Figure 3: (a) Top view SE image of the array of EBID deposits along with the etching scheme: The array of etc...
Figure 4: (a–j) Sidewall evolution as a result of the etching series. The frames (a) to (j) show the ten depo...
Figure 5: Resulting profiles for continued etching from below for 3 (a), 10 (b), 20 (c), and 45 (d) consecuti...
Figure 6: Simulations showing the evolution of the half-Gaussian-shaped sidewall (with σ = 200) of a deposit ...
Figure 7: (a) Top view SE image and (b) FIB cross section of an as-deposited FEBID structure.
Figure 8: (a) Top view SE image after etching of the sidewall and (b) after the cleaning step. (c) FIB cross ...
Beilstein J. Nanotechnol. 2018, 9, 2855–2882, doi:10.3762/bjnano.9.266
Figure 1: (a) SEM image of ALIS gas field ion source, produced with permission of [24], copyright 2010 Japanese J...
Figure 2: (a) ORION Plus He Ion Microscope from Zeiss AG, located at University of Southampton. (b) Schematic...
Figure 3: Electron and ion beam substrate penetration – Monte Carlo simulations of charged particle paths sho...
Figure 4: (a) Spin-coating results for fullerene resists HM-01A and HM-01C using anisole and chlorobenzene so...
Figure 5: Isolated dose-optimised SHIBL experiments on HM01 fullerene resist: 8 nm wide sparse exposed using ...
Figure 6: Results of SHIBL at 30 keV beam energy: (a) optical micrograph, (b) AFM image, (c) line profile (HM...
Figure 7: HIM image of dense (1:1) single-pixel features exposed at (a) 0.09 nC·cm−1 and (b) at 0.04 nC·cm−1 ...
Figure 8: (a) AFM and (b) corresponding HIM, (c) AFM and (d) corresponding SEM images of doughnuts fabricated...
Figure 9: (a) Schematic of the multibeam EBL system at TU Delft [45,46]. (b) Experimental multibeam tool using a Nov...
Figure 10: Schematic of electron beam induced deposition (EBID).
Figure 11: Schematic representation of the evolution of high-resolution electron beam induced deposition as a ...
Figure 12: Carbonaceous nanowires on bulk SiO2 such as the one in (a) slimmed by electron beam induced etching...
Figure 13: Left: SEM micrograph of an EBID mask consisting of 17 nm lines at 50 nm spacing, transferred into t...
Figure 14: (a) Thermographic scale representation of the electric field between tip and sample calculated by s...
Figure 15: (a) SEM image of self-sensing and self-actuated cantilever with the thermomechanical actuator and p...
Figure 16: (a) Schematic showing feedback loops combined in FE-eSPL tool enabling lithography using the curren...
Figure 17: Example of stitching test showing an AFM image obtained directly after FE-eSPL exposure, showing ne...
Figure 18: (a) Results of typical exposure dose test for determination of lithographic tone as a function of t...
Figure 19: AFM images of FE-eSPL patterning of different materials. (a) MoS2-flake on SiO2 substrate placed be...
Figure 20: Single-digit nanometre features written by FE-eSPL. (a) SEM image obtained after etching of 9 nm th...
Figure 21: (a, b) SEM images of volcano-gated tip. (c, d) Simulation of the electron beam/trajectories for vol...
Figure 22: (a) Electron trajectories for 30 keV EBL exposure of 100 nm calixarene film on a Si sample. (b) Ele...
Figure 23: SEM image of Quattro cantilever array used for parallel AFM imaging with four cantilevers.
Beilstein J. Nanotechnol. 2017, 8, 2376–2388, doi:10.3762/bjnano.8.237
Figure 1: Molecular structure of (a) 1,1-dichloro-1-silacyclohexane (cyclo-C5H10SiCl2) and (b) silacyclohexan...
Figure 2: Negative ion yield curve for the principal fragments formed by the electron attachment dissociation...
Figure 3: Positive ion mass spectra of (a) DCSCH and (b) SCH, both spectra are recorded at an electron impact...
Figure 4: Pillars grown by EBID from the precursors DCSCH (left) and SCH (right). The precursor pressure was ...
Figure 5: Measured (a) pillar base diameter, (b) pillar height and (c) heights of the cone-shaped upper part ...
Figure 6: (a) Pillar volume determined from the measured pillar diameter, pillar height, tip cone height and ...
Figure 7: a) Schematic showing the order of pillar deposition in a circular array around a central dot; b) sc...
Figure 8: Tilted (45°) and normal view of two sets of nine closely spaced pillars deposited in a circular arr...
Figure 9: Square arrays of pillars deposited with the indicated beam exposure time and neighbouring pillar di...
Figure 10: Monte Carlo simulation of the angular distribution of electrons emitted from a flat Si substrate wi...